The Dutch government on Friday said it would expand export licensing requirements for ASML’s 1970i and 1980i deep ultraviolet (DUV) immersion lithography tools, aligning its rules with export restrictions on these machines unilaterally imposed by the United States last year.
“In recent years, in order to maintain its global hegemony, the United States has continued to … coerce certain countries to tighten export control measures for semiconductors and (related) equipment … China is resolutely opposed to this,” China’s commerce ministry said in response to the Dutch government’s announcement on Friday.
The ministry added that the Dutch side should not abuse export controls, avoid measures that damage Sino-Dutch cooperation in semiconductors, and safeguard the “common interests of Chinese and Dutch enterprises”.